PHOTORESIST COMPOSITION

PROBLEM TO BE SOLVED: To provide a composition which is useful as a photoresist, particularly, as a DUV photoresist and is excellent in preserving and processing stability and has high resolution. SOLUTION: This composition is composed of (A) at least a single polymer, for example, poly[4-(l ethoxy...

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Bibliographische Detailangaben
Hauptverfasser:	KAARUUROORENTSU MERUTESUDORUFU, HANSUUTOOMASU SHIYAHATO, PASUKUAARE ARUFUREDO FUARUCHIINIYO, NORUBERUTO MIYUNTSUERU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTED CIRCUITS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a composition which is useful as a photoresist, particularly, as a DUV photoresist and is excellent in preserving and processing stability and has high resolution. SOLUTION: This composition is composed of (A) at least a single polymer, for example, poly[4-(l ethoxy ethoxy)styrene/4-(1-ethoxy ethoxy)vinyl cyclohexane/4-hydoxystyrene/4-vinyl cyclohexanol] which has average molecular weight M (a weight average) up to 1,000,000 from 4000 of 60 to 97.9wt.% with the total quantity of components A, B and C as a reference and is composed of a repetitive constitutive unit of a formular I to IV, (B) a dissolution inhibitor composed of one or more compounds which contain at least single acid unstable (C-O-C or C-O-Si) bonding of 2 to 40wt.% and has molecular weight up to 3000 and (C) a substance of 0.1 to 20wt.% to generate acid when exposed to chemical radioactive rays.