IN-LINE FILM FORMING DEVICE

PURPOSE: To prevent an in-line film forming device from vainly becoming long even when many kinds of film forming treatment are required before forming a film by installing a plurality of turning mechanisms which turn carriers by prescribed angles at the corners of a polygonal carrying path to a car...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	KAMIKURA HIROSHI, ARIGA YOSHIKI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS BLASTING CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FURNACES FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL HEATING INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL KILNS LIGHTING MECHANICAL ENGINEERING METALLURGY OPEN SINTERING OR LIKE APPARATUS OVENS PHYSICS RETORTS SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION WEAPONS
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Beschreibung
Zusammenfassung:	PURPOSE: To prevent an in-line film forming device from vainly becoming long even when many kinds of film forming treatment are required before forming a film by installing a plurality of turning mechanisms which turn carriers by prescribed angles at the corners of a polygonal carrying path to a carrying system. CONSTITUTION: An in-line film forming device is constituted of carriers 3 which can hold substrates 1 with the surfaces of the substrates 1 in the lateral direction against the carrying direction of the substrates 1, a carrying system which circulatively carries the carriers 3 along a polygonal carrying path 30, and a plurality of vacuum chambers 2 arranged along the path 30 so that the substrates 1 can be continuously subjected to film forming treatment in vacuums. In a film forming device constituted in such a way, the vacuum chambers 2 contain pluralities of film forming chambers installed to at least two sides of the path 30. The carrying system, in addition, is provided with a plurality of turning mechanisms which turn the carriers 3 by prescribed angles so that the surfaces of the substrates 1 can be turned in the lateral direction against the carrying direction of the substrates 1 at the corners of the path 30.