POLYETHER ETHER KETONE FILM BELT AND PRODUCTION THEREOF

PURPOSE: To obtain a film belt capable of being economically produced in high yield even if large in width and caliber and excellent in water resistance, chemical resistance, heat resistance and mechanical strength. CONSTITUTION: One end part 5 of a polyether ether ketone(PEEK) film 3 with a thickne...

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1. Verfasser: TSUTSUI SHIGERU
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE: To obtain a film belt capable of being economically produced in high yield even if large in width and caliber and excellent in water resistance, chemical resistance, heat resistance and mechanical strength. CONSTITUTION: One end part 5 of a polyether ether ketone(PEEK) film 3 with a thickness of 50-200μm formed into a strip like shape as shown by a drawing (a) is superposed on the other end part 4 thereof so as to form an overlap flap A of 0.5-3.0mm to bring the film to a state (b) and this overlap part 8 is placed on a receiving stand 10 and pressed from above by a horn 6 having a large number of chevron-shaped grooves 9 formed to the surface thereof at a pitch of 0.5-3.0mm to be brought to a state (c) and the horn 6 is subjected to ultrasonic vibration for 0.5-2sec in such a state that pressure of 5.5-9kg/cm is applied to the overlap part 8 to weld the overlap part ultrasonically to form the ring-shaped PEEK film belt 11 shown by a drawing (d).