HIGH ADHESION OXIDATION RESISTANT COATING FILM FOR C/C COMPOSITE MATERIAL AND ITS FORMATION

PURPOSE: To provide a high adhesion oxidation resistant coating film layer having excellent oxidation resistance, free from suffering damages such as stripping even if being repeatingly heated and excellent in adhesiveness. CONSTITUTION: A conversion coating film 3 of silicon carbide 30μm in average...

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Bibliographische Detailangaben
Hauptverfasser:	TAWARA TOMOYUKI, SHIYU KENPEI, EBATO OSAMU
Format:	Patent
Sprache:	eng
Schlagworte:	ARTIFICIAL STONE CEMENTS CERAMICS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS CONCRETE DIFFUSION TREATMENT OF METALLIC MATERIAL FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LAUNDERING LIME, MAGNESIA METALLURGY REFRACTORIES SLAG SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TEXTILES TREATMENT OF NATURAL STONE TREATMENT OF TEXTILES OR THE LIKE TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS,FABRICS, FEATHERS, OR FIBROUS GOODS MADE FROM SUCH MATERIALS
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Beschreibung
Zusammenfassung:	PURPOSE: To provide a high adhesion oxidation resistant coating film layer having excellent oxidation resistance, free from suffering damages such as stripping even if being repeatingly heated and excellent in adhesiveness. CONSTITUTION: A conversion coating film 3 of silicon carbide 30μm in average film thickness is formed by burying a C/C composite material 2 in an inorganic mixture, obtained by mixing 25wt.% silicon with 75wt.Z silicon carbide in a ball mill for 6hr, to put in a graphite crucible and allowing to react at 1600 deg.C for 280min. After that, a MoSi2 layer 4 is formed with 50μm film thickness on the surface of the conversion coating film 3 by plasma spraying.