METHOD AND DEVICE FOR TREATMENT

PURPOSE: To quickly remove a photoresist by supplying a treating fluid to an object to be treated set on a turntable at a position deviated from the center of rotation of the turntable while the object set on the turntable is rotated so that the fluid can be uniformly and efficiently supplied to the...

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Bibliographische Detailangaben
Hauptverfasser:	OFUKU AKIHIRO, OOSAKAYA TAKAYOSHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY CINEMATOGRAPHY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MATERIALS THEREFOR METALLURGY MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE: To quickly remove a photoresist by supplying a treating fluid to an object to be treated set on a turntable at a position deviated from the center of rotation of the turntable while the object set on the turntable is rotated so that the fluid can be uniformly and efficiently supplied to the surface of the object. CONSTITUTION: A flow passage 5 having a relatively narrow width is formed between an object 3, such as the semiconductor wafer, etc., and a guide plate on a turntable 2 over the entire surface of the object 3. While a treating fluid 7 composed of a mixed gas of oxygen and ozone, etc., is supplied to the flow passage 5 through a nozzle 6 opened at a position deviated from the center of rotation of the object 3 so that the fluid 7 can flow on the entire surface of the object 3, the surface of the object 3 is irradiated with ultraviolet rays having a prescribed wavelength which falls within a specific wavelength range from a light source 8 through the guide plate 4 so that a photoresist coating the surface of the object 3 can be oxidized quickly and removed as carbon dioxide, steam, etc. The carbon oxide, steam, etc., are discharged to the outside from an exhaust port 9.