COMPOSITION CONTAINING CYCLIC ACETAL OR CYCLIC KETAL OF BETA-KETO ESTER OR BETA-AMIDE

PROBLEM TO BE SOLVED: To provide a compsn. with which the formation of photosensitive layers of a wide range of thicknesses is possible and is adequately usable as a positive type photoresist for printing plates, printed circuits, integrated circuits, non-silver photographic films, etc. SOLUTION: Th...

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Bibliographische Detailangaben
1. Verfasser:	MAACHIN ROOTO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR AUXILIARY PROCESSES IN PHOTOGRAPHY BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a compsn. with which the formation of photosensitive layers of a wide range of thicknesses is possible and is adequately usable as a positive type photoresist for printing plates, printed circuits, integrated circuits, non-silver photographic films, etc. SOLUTION: This compsn. consists of (a) the compd. of the formula and (b) compds. (halogen compds., positive ion photoinitiators, etc.) which liberate an acid by exposure to chemical rays. The compsn. contains (a), (b) and (c) a binder (novolak, etc.). (an example of groups, R =methyl, phenyl, R to R =H, X=-O-, -NH-, m=2, 3, n=0, 1, Q = an aliphat. group, alicyclic group, arom. aliphat. group of (m) value).