RADIATION-SENSITIVE MIXTURE

PROBLEM TO BE SOLVED: To provide a radiation-sensitive mixture having high sensitivity against chemical radioactive rays, a difference between an exposed zone and an unexposed zone, and improved storage stability by containing a specific compound capable of being cleaved by acid and a compound formi...

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Hauptverfasser: MATEIASU AIHIHORUN, GERUHARUTO BUURU
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a radiation-sensitive mixture having high sensitivity against chemical radioactive rays, a difference between an exposed zone and an unexposed zone, and improved storage stability by containing a specific compound capable of being cleaved by acid and a compound forming strong acid when exposed to chemical radioactive rays. SOLUTION: This radiation-sensitive mixture contains a compound expressed by the formula having the C-O-C bond capable of being cleaved by acid and a compound forming strong acid when exposed to chemical radioactive rays as essential components, where R is the alkyl group substituted as required, R is hydrogen atom or the alkyl group having the carbon number of 1-4 substituted as required, R is the n-valent polymer-like aliphatic or aromatic group according to the requirement and (n) is an integer of 1-100. The group R is saturated/unsaturated, straight chair/branch chain, substituted/unsubstituted alkyl group, and halogen atom, particularly fluorine atom, the alkoxy group and phenyl group having the carbon number of 1-4 are preferable as the substitutional group. High sensitivity against chemical radioactive rays, particularly monochromatic light, is obtained, and the storage stability in the unexposed state is improved.