SYNTHETIC DIAMOND AND SYNTHESIS OF THE SAME

PURPOSE: To reduce the warpage of diamond obtd. by a vapor phase synthesis method and to enhance yield and to reduce cost without causing trouble to a subsequent working process such as polishing and a device process. CONSTITUTION: The peripheral part 1 of the surface of a substrate 5 is not scratch...

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Hauptverfasser: OJI MASATAKA, FUJIMORI NAOHARU
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE: To reduce the warpage of diamond obtd. by a vapor phase synthesis method and to enhance yield and to reduce cost without causing trouble to a subsequent working process such as polishing and a device process. CONSTITUTION: The peripheral part 1 of the surface of a substrate 5 is not scratched but the remaining part 2 of the surface is scratched and diamond is synthesized using the resultant substrate 5. In other way, the peripheral part of the surface of a substrate is coated with a heat resistant material and diamond is synthesized using the resultant substrate.