GAS PROCESSING APPARATUS

PURPOSE: To suitably process gas even if a specific technology is not required, to detect and warn a malfunction in response to the abnormal change in a gas flow rate and to stop the flow of the gas by previously setting an optimum flow rate of the gas corresponding to different processing condition...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: SAKAI DAIJI, UENO HITOSHI
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PURPOSE: To suitably process gas even if a specific technology is not required, to detect and warn a malfunction in response to the abnormal change in a gas flow rate and to stop the flow of the gas by previously setting an optimum flow rate of the gas corresponding to different processing conditions, and automatically regulating the gas flow rate at a set predetermined quantity. CONSTITUTION: This gas processing apparatus comprises mass flow controllers 7, 8 for automatically controlling the gas flow rates on the way of an oxygen gas passage 5 and a combustible gas passage 6, a control box 9 for controlling the controllers 7, 8 corresponding to the different processing conditions, and a warning means 29 connected to the box 9. When the flow rate abnormality of the gas is detected by the controllers 7, 8, it is warned by the means 29, and the passages 5, 6 are shut OFF.