SEMICONDUCTOR CLEANING EQUIPMENT

PURPOSE:To make the effective use of an area of a high degree of purity like a clean room by a method wherein an object to be processed can independently be processed by each individual function in a unit of process such as alien substance removal, metal separation organic substance separation, dryness or the like and a necessary cleaning process is performed by combination of optical process units. CONSTITUTION:An object to be processed can independently be processed by each individual function in a unit such as foreign substance removal process, metal separation process, organic substance separation process, ion kind removal process, oxide film separation process or drying process, and a necessary cleaning process is performed by combination of optical process units. For example, an object to be processed received by a unitinside carry handling mechanism built-in feeder 17 is supplied from a feeder 18 to another process equipment 10 via respective process units 11, 15, 16 directly coupled to each other in order of alien substance removal natural oxide film separation dryness. After the process in the another process equipment 10 is completed. the process is completed in order of foreign substance removal organic substance separation dryness, and the object is transferred to the next process equipment by the feeder 17.