METHOD FOR REFINING IMPURE AQUEOUS HYDROGEN PEROXIDE SOLUTION

METHOD FOR REFINING IMPURE AQUEOUS HYDROGEN PEROXIDE SOLUTION

PURPOSE: To refine an impure aq. hydrogen peroxide soln. and to obtain an aq. hydrogen peroxide soln. having extremely high quality, especially which can be used for the production of LSIs by allowing the impure aq. hydrogen peroxide soln. to pass through a cation exchange resin layer, a halogen-con...

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Hauptverfasser: SUGIHARA YASUO, SHIMOKAWA SHIGEKI
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Sprache:eng
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CHEMISTRY
COMPOUNDS THEREOF
INORGANIC CHEMISTRY
METALLURGY
NON-METALLIC ELEMENTS
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creator SUGIHARA YASUO
SHIMOKAWA SHIGEKI
description PURPOSE: To refine an impure aq. hydrogen peroxide soln. and to obtain an aq. hydrogen peroxide soln. having extremely high quality, especially which can be used for the production of LSIs by allowing the impure aq. hydrogen peroxide soln. to pass through a cation exchange resin layer, a halogen-contg. porous resin layer and an anion exchange resin layer for contact treatment. CONSTITUTION: An impure aq. hydrogen peroxide soln. is refined by allowing the soln. to pass through (1) a cation exchange resin layer, a halogen-contg. porous resin layer and an anion exchange resin layer in this order, or (2) a halogen-contg. porous resin layer, a cation exchange resin layer and an anion exchange resin layer, or (3) a halogen-contg. porous resin layer and a cation/ anion mixture resin layer in this order to bring the soln. into contact with each resin. By this refining method, an extremely high purity hydrogen peroxide having
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CONSTITUTION: An impure aq. hydrogen peroxide soln. is refined by allowing the soln. to pass through (1) a cation exchange resin layer, a halogen-contg. porous resin layer and an anion exchange resin layer in this order, or (2) a halogen-contg. porous resin layer, a cation exchange resin layer and an anion exchange resin layer, or (3) a halogen-contg. porous resin layer and a cation/ anion mixture resin layer in this order to bring the soln. into contact with each resin. By this refining method, an extremely high purity hydrogen peroxide having &lt;=5ppb metal cation content, &lt;=10ppb anion content, and &lt;=5ppb org. impurities can be obtd.</description><edition>6</edition><language>eng</language><subject>CHEMISTRY ; COMPOUNDS THEREOF ; INORGANIC CHEMISTRY ; METALLURGY ; NON-METALLIC ELEMENTS</subject><creationdate>1996</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19960604&amp;DB=EPODOC&amp;CC=JP&amp;NR=H08143303A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19960604&amp;DB=EPODOC&amp;CC=JP&amp;NR=H08143303A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SUGIHARA YASUO</creatorcontrib><creatorcontrib>SHIMOKAWA SHIGEKI</creatorcontrib><title>METHOD FOR REFINING IMPURE AQUEOUS HYDROGEN PEROXIDE SOLUTION</title><description>PURPOSE: To refine an impure aq. hydrogen peroxide soln. and to obtain an aq. hydrogen peroxide soln. having extremely high quality, especially which can be used for the production of LSIs by allowing the impure aq. hydrogen peroxide soln. to pass through a cation exchange resin layer, a halogen-contg. porous resin layer and an anion exchange resin layer for contact treatment. CONSTITUTION: An impure aq. hydrogen peroxide soln. is refined by allowing the soln. to pass through (1) a cation exchange resin layer, a halogen-contg. porous resin layer and an anion exchange resin layer in this order, or (2) a halogen-contg. porous resin layer, a cation exchange resin layer and an anion exchange resin layer, or (3) a halogen-contg. porous resin layer and a cation/ anion mixture resin layer in this order to bring the soln. into contact with each resin. By this refining method, an extremely high purity hydrogen peroxide having &lt;=5ppb metal cation content, &lt;=10ppb anion content, and &lt;=5ppb org. impurities can be obtd.</description><subject>CHEMISTRY</subject><subject>COMPOUNDS THEREOF</subject><subject>INORGANIC CHEMISTRY</subject><subject>METALLURGY</subject><subject>NON-METALLIC ELEMENTS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1996</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLD1dQ3x8HdRcPMPUghydfP08_RzV_D0DQgNclVwDAx19Q8NVvCIdAnyd3f1UwhwDfKP8HRxVQj29wkN8fT342FgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8V4BHgYWhibGxgbGjsbEqAEAWEIqXg</recordid><startdate>19960604</startdate><enddate>19960604</enddate><creator>SUGIHARA YASUO</creator><creator>SHIMOKAWA SHIGEKI</creator><scope>EVB</scope></search><sort><creationdate>19960604</creationdate><title>METHOD FOR REFINING IMPURE AQUEOUS HYDROGEN PEROXIDE SOLUTION</title><author>SUGIHARA YASUO ; SHIMOKAWA SHIGEKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH08143303A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1996</creationdate><topic>CHEMISTRY</topic><topic>COMPOUNDS THEREOF</topic><topic>INORGANIC CHEMISTRY</topic><topic>METALLURGY</topic><topic>NON-METALLIC ELEMENTS</topic><toplevel>online_resources</toplevel><creatorcontrib>SUGIHARA YASUO</creatorcontrib><creatorcontrib>SHIMOKAWA SHIGEKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SUGIHARA YASUO</au><au>SHIMOKAWA SHIGEKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD FOR REFINING IMPURE AQUEOUS HYDROGEN PEROXIDE SOLUTION</title><date>1996-06-04</date><risdate>1996</risdate><abstract>PURPOSE: To refine an impure aq. hydrogen peroxide soln. and to obtain an aq. hydrogen peroxide soln. having extremely high quality, especially which can be used for the production of LSIs by allowing the impure aq. hydrogen peroxide soln. to pass through a cation exchange resin layer, a halogen-contg. porous resin layer and an anion exchange resin layer for contact treatment. CONSTITUTION: An impure aq. hydrogen peroxide soln. is refined by allowing the soln. to pass through (1) a cation exchange resin layer, a halogen-contg. porous resin layer and an anion exchange resin layer in this order, or (2) a halogen-contg. porous resin layer, a cation exchange resin layer and an anion exchange resin layer, or (3) a halogen-contg. porous resin layer and a cation/ anion mixture resin layer in this order to bring the soln. into contact with each resin. By this refining method, an extremely high purity hydrogen peroxide having &lt;=5ppb metal cation content, &lt;=10ppb anion content, and &lt;=5ppb org. impurities can be obtd.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record>
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subjects CHEMISTRY
COMPOUNDS THEREOF
INORGANIC CHEMISTRY
METALLURGY
NON-METALLIC ELEMENTS
title METHOD FOR REFINING IMPURE AQUEOUS HYDROGEN PEROXIDE SOLUTION
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