METHOD FOR REFINING IMPURE AQUEOUS HYDROGEN PEROXIDE SOLUTION

PURPOSE: To refine an impure aq. hydrogen peroxide soln. and to obtain an aq. hydrogen peroxide soln. having extremely high quality, especially which can be used for the production of LSIs by allowing the impure aq. hydrogen peroxide soln. to pass through a cation exchange resin layer, a halogen-con...

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Hauptverfasser: SUGIHARA YASUO, SHIMOKAWA SHIGEKI
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE: To refine an impure aq. hydrogen peroxide soln. and to obtain an aq. hydrogen peroxide soln. having extremely high quality, especially which can be used for the production of LSIs by allowing the impure aq. hydrogen peroxide soln. to pass through a cation exchange resin layer, a halogen-contg. porous resin layer and an anion exchange resin layer for contact treatment. CONSTITUTION: An impure aq. hydrogen peroxide soln. is refined by allowing the soln. to pass through (1) a cation exchange resin layer, a halogen-contg. porous resin layer and an anion exchange resin layer in this order, or (2) a halogen-contg. porous resin layer, a cation exchange resin layer and an anion exchange resin layer, or (3) a halogen-contg. porous resin layer and a cation/ anion mixture resin layer in this order to bring the soln. into contact with each resin. By this refining method, an extremely high purity hydrogen peroxide having