FORMATION OF COATING FILM ON CYLINDRICAL SUBSTRATE AND COATER

PURPOSE: To provide a method for forming a uniform coating film excellent in thickness precision with good productivity and to provide a coater. CONSTITUTION: A cylindrical substrate is dipped in a coating soln. with its opening turned downward and then pulled up while supplying the coating soln. or...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	KONO TOSHIO, HIGASHIDE KAZUHIRO, HASEGAWA MASARU, UMEZAKI TETSUHIRO, SUDA OSAMU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL PERFORMING OPERATIONS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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Beschreibung
Zusammenfassung:	PURPOSE: To provide a method for forming a uniform coating film excellent in thickness precision with good productivity and to provide a coater. CONSTITUTION: A cylindrical substrate is dipped in a coating soln. with its opening turned downward and then pulled up while supplying the coating soln. or the level of the coating soln. is lowered to form a coating film on the substrate face. The coating soln. is continuously supplied to a coating system in which the substrate is dipped through a constant gas pressure to form a coating soln. supply state. A coating tank 1 to dip the cylindrical substrate 3 into the coating soln. and an agitated tank 2 to supply the coating soln. to the coating tank 1 are connected through a pipe. The agitated tank 2 is resistant to pressure and closed, and a pipe 12 pressurized with the gas for sending the coating soln. under pressure is connected to the upper part of the tank 2.