DEVICE FOR RUBBING TREATMENT OF ELECTRODE SUBSTRATE
PURPOSE: To prevent the slippage of a rubbing mask and the sticking of dust to an oriented film. CONSTITUTION: In this device, an electrode substrate 1a and a rubbing mask 30 are placed on the stage 50 in that order and at the time of driving a vacuum pump (not shown in the figures) in that state, a...
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Zusammenfassung: | PURPOSE: To prevent the slippage of a rubbing mask and the sticking of dust to an oriented film. CONSTITUTION: In this device, an electrode substrate 1a and a rubbing mask 30 are placed on the stage 50 in that order and at the time of driving a vacuum pump (not shown in the figures) in that state, air is sucked through suction paths 50a, 50b and 50c to hold the electrode substrate 1a and rubbing mask 30 on the stage 50 by the suction. Accordingly, the slippage of the rubbing mask 30, etc., is prevented from occurring even when a rubbing roller (not shown in the figures) is driven at the time of performing the rubbing treatment. Also, air in the space between the upper surface of the electrode substrate 1a and the rubbing mask 30 is sucked through suction paths 30b, 30c and 30d to secure the adhesion between the electrode substrate 1a and the rubbing mask 30 and therefore, dust is inhibited from entering into this space and the orientation defects, etc., due to sticking of dust is prevented from occurring. |
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