ALIGNER AND MANUFACTURE OF SEMICONDUCTOR DEVICE USING SAME
PURPOSE:To obtain such an aligner for semiconductor devices that a pattern on the surface of a mask irradiated with a luminous flux from an arcuated slit-like opening is projected upon a substrate with high accuracy by means of a mirror projecting optical system. CONSTITUTION:The slit 3 of an aligne...
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| creator | ISOHATA JUNJI SHIMEKI KOUICHI |
| description | PURPOSE:To obtain such an aligner for semiconductor devices that a pattern on the surface of a mask irradiated with a luminous flux from an arcuated slit-like opening is projected upon a substrate with high accuracy by means of a mirror projecting optical system. CONSTITUTION:The slit 3 of an aligner is made wider at its both end sections in the scanning direction as compared with its central part so that a pattern on the entire surface of a mask 4 irradiated in a slit-like state with light from a lighting system 1 through a slit 3 can be projected upon a wafer 5 by simultaneously scanning both the mask 4 and wafer 5 against a projecting optical system by means of a driving means when the pattern on the surface of a mask 4 is projected upon the surface of the wafer 5 through the projecting optical system. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPH0794404A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPH0794404A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPH0794404A3</originalsourceid><addsrcrecordid>eNrjZLBy9PF093MNUnD0c1HwdfQLdXN0DgkNclXwd1MIdvX1dPb3cwl1DvEPUnBxDfN0dlUIDfb0c1cIdvR15WFgTUvMKU7lhdLcDApuriHOHrqpBfnxqcUFicmpeakl8V4BHgbmliYmBiaOxkQoAQBcjCi5</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>ALIGNER AND MANUFACTURE OF SEMICONDUCTOR DEVICE USING SAME</title><source>esp@cenet</source><creator>ISOHATA JUNJI ; SHIMEKI KOUICHI</creator><creatorcontrib>ISOHATA JUNJI ; SHIMEKI KOUICHI</creatorcontrib><description>PURPOSE:To obtain such an aligner for semiconductor devices that a pattern on the surface of a mask irradiated with a luminous flux from an arcuated slit-like opening is projected upon a substrate with high accuracy by means of a mirror projecting optical system. CONSTITUTION:The slit 3 of an aligner is made wider at its both end sections in the scanning direction as compared with its central part so that a pattern on the entire surface of a mask 4 irradiated in a slit-like state with light from a lighting system 1 through a slit 3 can be projected upon a wafer 5 by simultaneously scanning both the mask 4 and wafer 5 against a projecting optical system by means of a driving means when the pattern on the surface of a mask 4 is projected upon the surface of the wafer 5 through the projecting optical system.</description><edition>6</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>1995</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19950407&DB=EPODOC&CC=JP&NR=H0794404A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19950407&DB=EPODOC&CC=JP&NR=H0794404A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ISOHATA JUNJI</creatorcontrib><creatorcontrib>SHIMEKI KOUICHI</creatorcontrib><title>ALIGNER AND MANUFACTURE OF SEMICONDUCTOR DEVICE USING SAME</title><description>PURPOSE:To obtain such an aligner for semiconductor devices that a pattern on the surface of a mask irradiated with a luminous flux from an arcuated slit-like opening is projected upon a substrate with high accuracy by means of a mirror projecting optical system. CONSTITUTION:The slit 3 of an aligner is made wider at its both end sections in the scanning direction as compared with its central part so that a pattern on the entire surface of a mask 4 irradiated in a slit-like state with light from a lighting system 1 through a slit 3 can be projected upon a wafer 5 by simultaneously scanning both the mask 4 and wafer 5 against a projecting optical system by means of a driving means when the pattern on the surface of a mask 4 is projected upon the surface of the wafer 5 through the projecting optical system.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1995</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLBy9PF093MNUnD0c1HwdfQLdXN0DgkNclXwd1MIdvX1dPb3cwl1DvEPUnBxDfN0dlUIDfb0c1cIdvR15WFgTUvMKU7lhdLcDApuriHOHrqpBfnxqcUFicmpeakl8V4BHgbmliYmBiaOxkQoAQBcjCi5</recordid><startdate>19950407</startdate><enddate>19950407</enddate><creator>ISOHATA JUNJI</creator><creator>SHIMEKI KOUICHI</creator><scope>EVB</scope></search><sort><creationdate>19950407</creationdate><title>ALIGNER AND MANUFACTURE OF SEMICONDUCTOR DEVICE USING SAME</title><author>ISOHATA JUNJI ; SHIMEKI KOUICHI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH0794404A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1995</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>ISOHATA JUNJI</creatorcontrib><creatorcontrib>SHIMEKI KOUICHI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ISOHATA JUNJI</au><au>SHIMEKI KOUICHI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ALIGNER AND MANUFACTURE OF SEMICONDUCTOR DEVICE USING SAME</title><date>1995-04-07</date><risdate>1995</risdate><abstract>PURPOSE:To obtain such an aligner for semiconductor devices that a pattern on the surface of a mask irradiated with a luminous flux from an arcuated slit-like opening is projected upon a substrate with high accuracy by means of a mirror projecting optical system. CONSTITUTION:The slit 3 of an aligner is made wider at its both end sections in the scanning direction as compared with its central part so that a pattern on the entire surface of a mask 4 irradiated in a slit-like state with light from a lighting system 1 through a slit 3 can be projected upon a wafer 5 by simultaneously scanning both the mask 4 and wafer 5 against a projecting optical system by means of a driving means when the pattern on the surface of a mask 4 is projected upon the surface of the wafer 5 through the projecting optical system.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | ALIGNER AND MANUFACTURE OF SEMICONDUCTOR DEVICE USING SAME |
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