FORMING METHOD OF THIN FILM AND PRODUCTION OF THIN FILM MAGNETIC HEAD USING THE SAME

PURPOSE:To obtain a good magnetic core having no breaking of films even on an uneven surface by forming a resist pattern to have a reversely tapered shape in the area except for the magnetic core part. CONSTITUTION:A Co-Ta-Zr amorphous magnetic film 7 is formed by sputtering on a substrate 11 having a normally tapered step part 10 and a resist pattern 6 having reversely tapered form. Then, an Au/Cr film 8 is formed by vapor deposition on the surface of the magnetic film 7. Since the resist pattern 6 is reversely tapered, the amorphous magnetic film 7 is reversely tapered so that the Au/Cr film 8 is prevented from depositing on the side walls of the resist pattern 6 and on the side wall of the amorphous magnetic film 7. Then, the amorphous magnetic film 7 is chemically etched, the magnetic film 7 on the side wall of the resist pattern 6 has poor denseness so that this area is etched in a short time and the magnetic film 7 is cut. However, the step part 10 is protected by the vapor deposition film 8 so that the step 10 is not etched with the etching liquid. Thus, after the resist pattern 6 is removed, a good magnetic film 11 without cutting in the film is obtd.