FORMING METHOD OF THIN FILM AND PRODUCTION OF THIN FILM MAGNETIC HEAD USING THE SAME

PURPOSE:To obtain a good magnetic core having no breaking of films even on an uneven surface by adding such a process to form a second resist pattern on a thin film of a first resist pattern on the substrate except for at least an edge area. CONSTITUTION:A Co-Ta-Zr amorphous magnetic film 7 is formed by sputtering on a substrate 1 having a step part 10 and a first resist pattern 6. Then, a second resist pattern 8 is formed on the surface of the magnetic film except for the area on the resist pattern 6 and near the step of the pattern 6. Then, the amorphous magnetic film 7 is chemically etched. Since the magnetic film in the step part of the resist pattern 6 has a poor denseness, this area is etched in a short time and the magnetic film 7 is cut. However, the step part 10 is protected by the resist pattern 8 so that the film 7 in the step part is not etched with the etching liquid. Thus, after the resist pattern 6, 8 is removed, the magnetic film 11 without breaking can be formed.