SOLVENT, SOLUTION-TYPE QUINONE DIAZIDE PHOTOSENSITIVE AGENT, PHOTORESIST COMPOSITION, AND CLEANING LIQUID

PURPOSE:To obtain a good solvent for a quinone diazide photosensitive agent, to improve stability and safeness of the agent by preparing the photosensitive as a soln., to make management and control of the process easy, to suppress precipitation of fine foreign matter in a positive resist which is c...

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Hauptverfasser:	OHASHI KAZUTOSHI, MINOBE MASAO, OOI SATSUO, SHIRAGAMI NOBORU
Format:	Patent
Sprache:	eng
Schlagworte:	ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CANDLES CHEMISTRY CINEMATOGRAPHY DETERGENT COMPOSITIONS DETERGENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY FATTY ACIDS THEREFROM HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS RECOVERY OF GLYCEROL RESIN SOAPS SEMICONDUCTOR DEVICES SOAP OR SOAP-MAKING USE OF SINGLE SUBSTANCES AS DETERGENTS
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Beschreibung
Zusammenfassung:	PURPOSE:To obtain a good solvent for a quinone diazide photosensitive agent, to improve stability and safeness of the agent by preparing the photosensitive as a soln., to make management and control of the process easy, to suppress precipitation of fine foreign matter in a positive resist which is conventionally regarded as a problem, and to make possible fast and high reliable cleaning by using the solvent as a cleaning liquid for various devices and facilities in which a quinone diazide compd. is used as a photosensitive agent, for example, for a spin coater line. CONSTITUTION:This solvent for a quinone diazide compd. essentially consists of at least one compd. containing fluorine atoms selected from alcohols, esters, ethers, and phenols. The photosensitive agent is prepared by dissolving a quinone diazide compd. in this solvent. The positive photoresist compsn. contains an alkali-soluble resin, quinone diazide compd. as the photosensitive agent, and this solvent. Further, the cleaning liquid essentially consists of the solvent and is used for such a line in which a resist liquid containing a quinone diazide compd. is passed through.