JPH0747611B

PURPOSE:To obtain the subject resin having stable antistatic properties and resistance to high-temperature, wear and solvent, comprising polymer main chain of high-molecular weight polester and side chain of copolymer composed of sulfonate group - containing unsaturated monomer and other unsaturated...

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Bibliographische Detailangaben
Hauptverfasser: SANENOBU KAZUYUKI, FUKUDA MASAYUKI, MIURA SADAMI
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PURPOSE:To obtain the subject resin having stable antistatic properties and resistance to high-temperature, wear and solvent, comprising polymer main chain of high-molecular weight polester and side chain of copolymer composed of sulfonate group - containing unsaturated monomer and other unsaturated monomer. CONSTITUTION:The aimed resin is graft-type polymer composed of main chain of polyester having >=2,000, preferably >=5,000 average molecular weight and side chain of copolymer composed of sulfonate group - containing unsaturated monomer (e.g., sodium vinylsulfonate) and other unsaturated monomer (e.g., methyl methacrylate).