COATING FILM-FORMING FILM AND ITS PRODUCTION

PURPOSE:To produce a coating film-forming film having high airtightness. CONSTITUTION:A vacuum vessel 1 is evacuated by a vacuum pump and a crucible 2 contg. solid SiO as a material for vapor deposition 11 is heated. While depositing generated SiO vapor on a film 12, nitrogen from a nitrogen cylinde...

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Bibliographische Detailangaben
Hauptverfasser:	HANANAKA KATSUYASU, KOBAYASHI TOSHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PURPOSE:To produce a coating film-forming film having high airtightness. CONSTITUTION:A vacuum vessel 1 is evacuated by a vacuum pump and a crucible 2 contg. solid SiO as a material for vapor deposition 11 is heated. While depositing generated SiO vapor on a film 12, nitrogen from a nitrogen cylinder is ionized by an ion gun 3 and radiated on the film 12 to form a coating film of SiON on the surface of the film 12.