PHOTOSENSITIVE RESIN COMPOSITION
PURPOSE:To improve the developing rate in a developing process for a photosensitive resin plate and to improve reproducibility of images by preparing the compsn. having specified or lower solubility of a hydrophilic component with water and having specified or higher solubility with water containing...
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| creator | TANAKA SHINICHI KAWAHARA KEIZO TANIYAMA TSUKASA ONODERA KOSAKU SHIBANO HIROSHI |
| description | PURPOSE:To improve the developing rate in a developing process for a photosensitive resin plate and to improve reproducibility of images by preparing the compsn. having specified or lower solubility of a hydrophilic component with water and having specified or higher solubility with water containing a surfactant. CONSTITUTION:This photosensitive resin compsn. contains a hydrophobic component and a hydrophilic component. The solubility of the hydrophilic component with water is 2%. The hydrophobic component consists of a compsn. of polymers insoluble with water, and for example, polymers to give hardness and stability to the plate such as 1,4-polybutadiene is used. As for the hydrophilic component, a compsn. of hydrophilic polymer such as poly(meth)acrylic acid and its esters are used. Thereby, the obtd. compsn. can be developed with a water-base developer but has high durability against a water-base ink. |
| format | Patent |
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CONSTITUTION:This photosensitive resin compsn. contains a hydrophobic component and a hydrophilic component. The solubility of the hydrophilic component with water is <2% and the solubility with water containing a surfactant is >2%. The hydrophobic component consists of a compsn. of polymers insoluble with water, and for example, polymers to give hardness and stability to the plate such as 1,4-polybutadiene is used. As for the hydrophilic component, a compsn. of hydrophilic polymer such as poly(meth)acrylic acid and its esters are used. Thereby, the obtd. compsn. can be developed with a water-base developer but has high durability against a water-base ink.</description><edition>6</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>1995</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19951114&DB=EPODOC&CC=JP&NR=H07301920A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19951114&DB=EPODOC&CC=JP&NR=H07301920A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TANAKA SHINICHI</creatorcontrib><creatorcontrib>KAWAHARA KEIZO</creatorcontrib><creatorcontrib>TANIYAMA TSUKASA</creatorcontrib><creatorcontrib>ONODERA KOSAKU</creatorcontrib><creatorcontrib>SHIBANO HIROSHI</creatorcontrib><title>PHOTOSENSITIVE RESIN COMPOSITION</title><description>PURPOSE:To improve the developing rate in a developing process for a photosensitive resin plate and to improve reproducibility of images by preparing the compsn. having specified or lower solubility of a hydrophilic component with water and having specified or higher solubility with water containing a surfactant. CONSTITUTION:This photosensitive resin compsn. contains a hydrophobic component and a hydrophilic component. The solubility of the hydrophilic component with water is <2% and the solubility with water containing a surfactant is >2%. The hydrophobic component consists of a compsn. of polymers insoluble with water, and for example, polymers to give hardness and stability to the plate such as 1,4-polybutadiene is used. As for the hydrophilic component, a compsn. of hydrophilic polymer such as poly(meth)acrylic acid and its esters are used. Thereby, the obtd. compsn. can be developed with a water-base developer but has high durability against a water-base ink.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1995</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFAI8PAP8Q929Qv2DPEMc1UIcg329FNw9vcN8AeJ-PvxMLCmJeYUp_JCaW4GRTfXEGcP3dSC_PjU4oLE5NS81JJ4rwAPA3NjA0NLIwNHY2LUAAAujiKO</recordid><startdate>19951114</startdate><enddate>19951114</enddate><creator>TANAKA SHINICHI</creator><creator>KAWAHARA KEIZO</creator><creator>TANIYAMA TSUKASA</creator><creator>ONODERA KOSAKU</creator><creator>SHIBANO HIROSHI</creator><scope>EVB</scope></search><sort><creationdate>19951114</creationdate><title>PHOTOSENSITIVE RESIN COMPOSITION</title><author>TANAKA SHINICHI ; KAWAHARA KEIZO ; TANIYAMA TSUKASA ; ONODERA KOSAKU ; SHIBANO HIROSHI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH07301920A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1995</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>TANAKA SHINICHI</creatorcontrib><creatorcontrib>KAWAHARA KEIZO</creatorcontrib><creatorcontrib>TANIYAMA TSUKASA</creatorcontrib><creatorcontrib>ONODERA KOSAKU</creatorcontrib><creatorcontrib>SHIBANO HIROSHI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TANAKA SHINICHI</au><au>KAWAHARA KEIZO</au><au>TANIYAMA TSUKASA</au><au>ONODERA KOSAKU</au><au>SHIBANO HIROSHI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PHOTOSENSITIVE RESIN COMPOSITION</title><date>1995-11-14</date><risdate>1995</risdate><abstract>PURPOSE:To improve the developing rate in a developing process for a photosensitive resin plate and to improve reproducibility of images by preparing the compsn. having specified or lower solubility of a hydrophilic component with water and having specified or higher solubility with water containing a surfactant. CONSTITUTION:This photosensitive resin compsn. contains a hydrophobic component and a hydrophilic component. The solubility of the hydrophilic component with water is <2% and the solubility with water containing a surfactant is >2%. The hydrophobic component consists of a compsn. of polymers insoluble with water, and for example, polymers to give hardness and stability to the plate such as 1,4-polybutadiene is used. As for the hydrophilic component, a compsn. of hydrophilic polymer such as poly(meth)acrylic acid and its esters are used. Thereby, the obtd. compsn. can be developed with a water-base developer but has high durability against a water-base ink.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | PHOTOSENSITIVE RESIN COMPOSITION |
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