PHOTOSENSITIVE RESIN COMPOSITION

PURPOSE:To improve the developing rate in a developing process for a photosensitive resin plate and to improve reproducibility of images by preparing the compsn. having specified or lower solubility of a hydrophilic component with water and having specified or higher solubility with water containing...

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Bibliographische Detailangaben
Hauptverfasser:	TANAKA SHINICHI, KAWAHARA KEIZO, TANIYAMA TSUKASA, ONODERA KOSAKU, SHIBANO HIROSHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	PURPOSE:To improve the developing rate in a developing process for a photosensitive resin plate and to improve reproducibility of images by preparing the compsn. having specified or lower solubility of a hydrophilic component with water and having specified or higher solubility with water containing a surfactant. CONSTITUTION:This photosensitive resin compsn. contains a hydrophobic component and a hydrophilic component. The solubility of the hydrophilic component with water is 2%. The hydrophobic component consists of a compsn. of polymers insoluble with water, and for example, polymers to give hardness and stability to the plate such as 1,4-polybutadiene is used. As for the hydrophilic component, a compsn. of hydrophilic polymer such as poly(meth)acrylic acid and its esters are used. Thereby, the obtd. compsn. can be developed with a water-base developer but has high durability against a water-base ink.