METHOD FOR DEVELOPING PHOTOSENSITIVE RESIN PLATE
PURPOSE:To increase the rate of development and to improve image reproducibility in a process for developing a photosensitive resin plate. CONSTITUTION:When a photosensitive resin plate with a layer of a photosensitive resin compsn. contg. a hydrophobic component and a hydrophilic component is devel...
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| creator | TANAKA SHINICHI KAWAHARA KEIZO TANIYAMA TSUKASA ONODERA KOSAKU SHIBANO HIROSHI |
| description | PURPOSE:To increase the rate of development and to improve image reproducibility in a process for developing a photosensitive resin plate. CONSTITUTION:When a photosensitive resin plate with a layer of a photosensitive resin compsn. contg. a hydrophobic component and a hydrophilic component is developed, the unexposed part is processed with a developer having dissolving or dispersing ability to the hydrophilic component and contg. alkali metal ions so as to disperse the photosensitive resin compsn. in the unexposed part as particles of |
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CONSTITUTION:When a photosensitive resin plate with a layer of a photosensitive resin compsn. contg. a hydrophobic component and a hydrophilic component is developed, the unexposed part is processed with a developer having dissolving or dispersing ability to the hydrophilic component and contg. alkali metal ions so as to disperse the photosensitive resin compsn. in the unexposed part as particles of <=100mum particle diameter.</description><edition>6</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>1995</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19951110&DB=EPODOC&CC=JP&NR=H07295238A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19951110&DB=EPODOC&CC=JP&NR=H07295238A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TANAKA SHINICHI</creatorcontrib><creatorcontrib>KAWAHARA KEIZO</creatorcontrib><creatorcontrib>TANIYAMA TSUKASA</creatorcontrib><creatorcontrib>ONODERA KOSAKU</creatorcontrib><creatorcontrib>SHIBANO HIROSHI</creatorcontrib><title>METHOD FOR DEVELOPING PHOTOSENSITIVE RESIN PLATE</title><description>PURPOSE:To increase the rate of development and to improve image reproducibility in a process for developing a photosensitive resin plate. 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CONSTITUTION:When a photosensitive resin plate with a layer of a photosensitive resin compsn. contg. a hydrophobic component and a hydrophilic component is developed, the unexposed part is processed with a developer having dissolving or dispersing ability to the hydrophilic component and contg. alkali metal ions so as to disperse the photosensitive resin compsn. in the unexposed part as particles of <=100mum particle diameter.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | METHOD FOR DEVELOPING PHOTOSENSITIVE RESIN PLATE |
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