METHOD FOR DEVELOPING PHOTOSENSITIVE RESIN PLATE

PURPOSE:To increase the rate of development and to improve image reproducibility in a process for developing a photosensitive resin plate. CONSTITUTION:When a photosensitive resin plate with a layer of a photosensitive resin compsn. contg. a hydrophobic component and a hydrophilic component is devel...

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Bibliographische Detailangaben
Hauptverfasser:	TANAKA SHINICHI, KAWAHARA KEIZO, TANIYAMA TSUKASA, ONODERA KOSAKU, SHIBANO HIROSHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	PURPOSE:To increase the rate of development and to improve image reproducibility in a process for developing a photosensitive resin plate. CONSTITUTION:When a photosensitive resin plate with a layer of a photosensitive resin compsn. contg. a hydrophobic component and a hydrophilic component is developed, the unexposed part is processed with a developer having dissolving or dispersing ability to the hydrophilic component and contg. alkali metal ions so as to disperse the photosensitive resin compsn. in the unexposed part as particles of