VACUUM VAPOR DEPOSITION DEVICE

PURPOSE:To provide such a winding-type vacuum vapor deposition device that variation of characteristics in the width direction of a substrate is decreased and excellent quality and production yield can be obtd. CONSTITUTION:This device is equipped with a mechanism to carry a polymer substrate, a vap...

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Bibliographische Detailangaben
1. Verfasser:	NISHIZAWA YASUHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PURPOSE:To provide such a winding-type vacuum vapor deposition device that variation of characteristics in the width direction of a substrate is decreased and excellent quality and production yield can be obtd. CONSTITUTION:This device is equipped with a mechanism to carry a polymer substrate, a vapor source, and a mechanism to scan electron beams 6 in the vacuum chamber. A thin film is continuously formed on a polymer substrate by scanning electron beams 6 while changes in the indident angle of electron beams to the vapor source are suppressed to within 5 degrees and by heating the vapor source.