PRODUCTION OF POLYAMIDE RESIN

PURPOSE:To obtain a polyamide resin with low content of both monomer and oligomer. CONSTITUTION:This polyamide resin is such that its molecular chain ends are blocked by monocarboxylic acid groups. The monomer and oligomer existing in this polyamide is removed using a thin film evaporator.

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Bibliographische Detailangaben
Hauptverfasser:	TONOMURA HIDEAKI, FUJII KOICHI, ONISHI KATSUMI, FUKUDA KATSUMITSU
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMISTRY COMPOSITIONS BASED THEREON MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	PURPOSE:To obtain a polyamide resin with low content of both monomer and oligomer. CONSTITUTION:This polyamide resin is such that its molecular chain ends are blocked by monocarboxylic acid groups. The monomer and oligomer existing in this polyamide is removed using a thin film evaporator.