MANUFACTURE OF MAGNETIC DISC

PURPOSE:To obtain a magnetic disc suitable for high density recording by a method wherein a plasma is moved by adjusting the radius of a plasma ring to control the incident angles of particles and a film forming rate. CONSTITUTION:A disc substrate 100 and a target 205 are placed between electrodes w...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	SHIGE NORIYUKI, KANEKO SHINICHI, IWAGAMI KAZUYOSHI, FUJITA SHIOJI, URA KAZUHIRO, TAKASU SACHIKO, SASAKI SHINJI, HONDA YOSHINORI, KATAOKA HIROYUKI
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PURPOSE:To obtain a magnetic disc suitable for high density recording by a method wherein a plasma is moved by adjusting the radius of a plasma ring to control the incident angles of particles and a film forming rate. CONSTITUTION:A disc substrate 100 and a target 205 are placed between electrodes which are composed of coils 201-203 and yokes 204 so as to have the center axis of a plasma ring 206 on the substrate 100 and the target 205. By varying a current applied to the middle coil 202, the radius of the plasma ring 206 is varied and hence a plasma is moved. The plasma is moved while a Cr foundation film is formed on the substrate 100 to adjust the incident directions of Cr particles and film forming rates in that direction. With this constitution, a film thickness distribution in the substrate surface can be suppressed and uniform thicknesses are maintained and a magnetic disc which has high magnetic anisotropy in a circumferential direction can be obtained.