MASK MATERIAL FOR SUPERCONDUCTIVE THIN FILM

PURPOSE:To form a mask material into a pattern with fine lines and grooves without deteriorating it in superconductive properties by a method wherein a mask material used in an oxide superconductive thin film patterning process is composed of a first and a second organic resist film and a metal film...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	TARUYA YOSHINOBU, KABASAWA TAKANORI, TAKAGI KAZUMASA, TSUKAMOTO AKIRA, FUKAZAWA TOKUMI
Format:	Patent
Sprache:	eng
Schlagworte:	ELECTRICITY
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!