REFLECTING MASK AND ITS MANUFACTURING METHOD AS WELL AS EXPOSURE DEVICE USING THE MASK

PURPOSE:To provide a novel correcting method of white defectives as well as the reflecting mask in excellent pattern shape with high precious line width while increasing the yield of the reflecting mask further doing no damage to a multilayer film at all. CONSTITUTION:The reflecting mask is composed...

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Bibliographische Detailangaben
Hauptverfasser:	WATANABE YUTAKA, HAYASHIDA MASAMI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GAMMA RAY OR X-RAY MICROSCOPES HOLOGRAPHY IRRADIATION DEVICES MATERIALS THEREFOR NUCLEAR ENGINEERING NUCLEAR PHYSICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR
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Beschreibung
Zusammenfassung:	PURPOSE:To provide a novel correcting method of white defectives as well as the reflecting mask in excellent pattern shape with high precious line width while increasing the yield of the reflecting mask further doing no damage to a multilayer film at all. CONSTITUTION:The reflecting mask is composed of a reflecting part 2 comprising a multi-layer film, non-reflecting parts comprising absorber pattern 3 formed on the multiple layer film and the other non-reflecting part 5 breaking the regularity in the periodic structure of the multilayer film.