DIELECTRIC MASK FOR LASER BEAM MACHINING AND ITS PRODUCTION

PURPOSE:To obtain a dielectric mask having good pattern accuracy by forming patterns for lift-off of a material consisting of a polyimide system on a substrate which allows transmission of laser beams and forming multilayered dielectric films thereon, then removing the patterns for lift-off and the...

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Bibliographische Detailangaben
Hauptverfasser:	SATO HIDEMI, TOGAWA HIDEO, TERABAYASHI TAKAO, AMAMIYA KYOKO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY CLADDING OR PLATING BY SOLDERING OR WELDING CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACHINE TOOLS MATERIALS THEREFOR METAL-WORKING NOT OTHERWISE PROVIDED FOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SOLDERING OR UNSOLDERING TRANSPORTING WELDING WORKING BY LASER BEAM
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