SURFACE PROCESSING AGENT OF SILICON DIOXIDE AND SILICON NITRIDE BASE FILM

PURPOSE:To provide a surface processing agent capable of evenly surface processing even into fine region further avoiding the metallic pollution by a chemical solution by a method wherein water solution of exceeding one kind of elements out of HF, NH3, H2O2 or specific amount of specific interface a...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	MIYAMOTO MITSUO, TATENO TOSHIO, KITA NAOHIDE, ISHIDA SHOICHI
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES BASIC ELECTRIC ELEMENTS CANDLES CHEMISTRY DETERGENT COMPOSITIONS DETERGENTS DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FATTY ACIDS THEREFROM MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS POLISHES RECOVERY OF GLYCEROL RESIN SOAPS SEMICONDUCTOR DEVICES SOAP OR SOAP-MAKING USE OF SINGLE SUBSTANCES AS DETERGENTS
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Beschreibung
Zusammenfassung:	PURPOSE:To provide a surface processing agent capable of evenly surface processing even into fine region further avoiding the metallic pollution by a chemical solution by a method wherein water solution of exceeding one kind of elements out of HF, NH3, H2O2 or specific amount of specific interface activator is added to water. CONSTITUTION:Within the surface processing agent wherein a specific interfacial activator is added to a water solution or water comprising at least one kind of element selected out of l-200ppm of HF, NH3, H2O2, the interfacial activator is an organic compound having the composition mentioned as follows. The composition of the interfacial activator is to be R-(O-CnHzn)mC00H, R-(O- CnHzn)mCOOH, R-(O-CnHzn)mNH2 or R-(O-CnHzn)mOH, where a saturated hydrocarbon: in carbon number of 1-10, n: 1, 2 or 3, m:1 or 2, interfacial activator compound: e.g. CH3 (CH2)3 OCH2CH2 COOH, C4H9O(CH2)3 NH2, C2H5 OCH2CH2OH etc.