SPINNER CLEANING EQUIPMENT
PURPOSE:To protect a wafer against wetting due to splash from the rear side of an upper cover, when the wafer is taken out after cleaning and drying, by disposing the upper cover while inclining in one direction and retracting a side cover downward when an object to be cleaned is carried in or out....
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | PURPOSE:To protect a wafer against wetting due to splash from the rear side of an upper cover, when the wafer is taken out after cleaning and drying, by disposing the upper cover while inclining in one direction and retracting a side cover downward when an object to be cleaned is carried in or out. CONSTITUTION:An upper cover 8 is secured, on one side face thereof, to the upper end part of a bracket cover 6 through a stopper and has a plan view similar to a vessel 1b. The upper cover 8 also has a peripheral part 8a of substantially L-shaped cross-section and a top plate 8b formed on a surface inclining in one direction. A side cover 10 comprises a drum section having a plan view similar to the vessel section 1b but slightly smaller than that and the drum section is moved up and down between the upper cover 8 and the vessel section 1b by means of cylinders 11 for up/down motion. In other words, when the cylinders 11 are operated simultaneously to retract a rod 11a, the side cover 10 is lowered and housed in the vessel section 1b. Consequently, the side cover 10 is located at a retracted position. |
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