PRODUCTION OF PROTECTIVE FILM FOR MAGNETIC HEAD

PURPOSE:To obtain the max. surface roughness by such a method that does not degrade the electromagnetic conversion characteristics. CONSTITUTION:The sliding surface is treated by sputtering with using a mixture gas selecting each one or more kinds of gas from groups of inert gas such as Ar, Ne, Kr a...

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1. Verfasser: NASU SHOGO
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE:To obtain the max. surface roughness by such a method that does not degrade the electromagnetic conversion characteristics. CONSTITUTION:The sliding surface is treated by sputtering with using a mixture gas selecting each one or more kinds of gas from groups of inert gas such as Ar, Ne, Kr and reactive gas such as O2, N2 NH3, or treated with ions or plasma to form a protective film 4. Thereby, when the sliding surface of the head is roughened with plasma or ion to obtain the max. surface roughness and to obtain excellent wear resistance, no step (recess) is formed in a thin film layer of metal or oxide on the sliding surface of the head.