COATING METHOD OF WATER PAINT AND IMAGE FORMING METHOD

COATING METHOD OF WATER PAINT AND IMAGE FORMING METHOD

PURPOSE:To uniformly apply a water paint for forming a color pattern in thin film thickness by forming a pattern on a substrate by using a positive photoresist and after irradiating with electromagnetic radiation, applying the water paint. CONSTITUTION:The water paint is uniformly applied on the pat...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: YAMANE HIROSHI, KODERA SHIGEO, TATSUZONO SHINICHI, TSUBOI MASAAKI
Format: Patent
Sprache:eng
Schlagworte:
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING
FREQUENCY-CHANGING
NON-LINEAR OPTICS
OPTICAL ANALOGUE/DIGITAL CONVERTERS
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICAL LOGIC ELEMENTS
OPTICS
PHYSICS
TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:PURPOSE:To uniformly apply a water paint for forming a color pattern in thin film thickness by forming a pattern on a substrate by using a positive photoresist and after irradiating with electromagnetic radiation, applying the water paint. CONSTITUTION:The water paint is uniformly applied on the pattern of the positive photoresist by applying the water paint after irradiating the resist pattern on the substrate with electromagnetic radiation. That is, the water paint is uniformly applied by irradiating the positive photoresist pattern with electromagnetic radiation, e.g. ultraviolet ray, to make the surface of the resist hydrophilic. And at the time of lift-off, since the pattern of the positive photoresist is made easily soluble in alkali, the pattern formed by the water paint becomes sharp and the residue of the positive photoresist does not remain at the edge or corner part of the pattern.