SUBSTRATE TREATING DEVICE

PURPOSE:To provide a substrate treating device which prevents the degradation in the yield of substrates to be treated by regulating the ratio of the circulating amt. of a treating liquid with respect to the inside volume of a treating vessel to an adequate range. CONSTITUTION:An outside vessel 12 is disposed around the treating vessel 11 so as to cover the treating vessel from below and the treating liquid 13 is filled in an overflowable state in the treating vessel 11. The treating liquid 13 overflowing therefrom is recovered in an outside vessel 12. A piping 14 is installed between the treating vessel 11 and the outside vessel 12 and a circulating pump 15 is disposed at the piping 14 to circulate the treating liquid 13 from the outside vessel 12 to the treating vessel 11. The glass substrates 21 are inserted together with a cassette 22 into the treating vessel 11 and are treated while the treating liquid 13 is made to flow over to the outside vessel 12 at the time of housing the glass substrates into the cassette 22 and the substrates is subjected to prescribed treatments, such as etching and washing. The circulating amt. B (1/min) of the treating liquid 13 to be sent from the outside vessel 12 to the treating vessel 11 is so set by the circulation device 18 that the ratio B/A attains >=0.6 when the inside volume of the treating vessel 11 is defined as A [1].