CYLINDRICAL REFLECTING MASK, EXPOSURE METHOD AND ALIGNER USING THE MASK AS WELL AS SEMICONDUCTOR DEVICE MANUFACTURED BY THEM

PURPOSE:To obtain the aligner which reduces a driving part, whose temperature controllability is enhanced and whose illuminating region is fixed by a method wherein a cylindrical reflecting mask is turned by making use of its axis as a shaft and an object to be exposed is moved to a direction nearly...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HAYASHIDA MASAMI, KATO HIDEO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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