HIGH ACCURACY GAS DILUTION SYSTEM

PURPOSE:To obtain a system for producing an uncontaminated sample gas diluted at high accuracy. CONSTITUTION:A main line 10 is provided with a flow rate sensor 16 and an exhaust gas flow rate control valve 15, fixed to an exhaust gas line 14, is controlled such that the flow rate sensor 16 will dete...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	TSUBOTA OSAMU, KITAMURA KAZUMI
Format:	Patent
Sprache:	eng
Schlagworte:	CONTROLLING INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PHYSICS REGULATING SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES TESTING TRANSPORTING
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Beschreibung
Zusammenfassung:	PURPOSE:To obtain a system for producing an uncontaminated sample gas diluted at high accuracy. CONSTITUTION:A main line 10 is provided with a flow rate sensor 16 and an exhaust gas flow rate control valve 15, fixed to an exhaust gas line 14, is controlled such that the flow rate sensor 16 will detect a preset flow rate of primary diluted gas. The primary diluted gas thus controlled is then admixed with a secondary diluted gas fed from a secondary diluted gas line 18 to produce a sample gas which is fed to the analyzer side through a sample gas supply line 20.