SEMICONDUCTOR DEVICE
PURPOSE:To prevent contamination on a gate mounting electrode plane composed of Al film or Al alloy film before TAB mounting process. CONSTITUTION:An anodic oxide film 19 using electrochemical method is formed around on a mounting electrode formed of Al film or Al alloy film on the side of a gate wh...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | PURPOSE:To prevent contamination on a gate mounting electrode plane composed of Al film or Al alloy film before TAB mounting process. CONSTITUTION:An anodic oxide film 19 using electrochemical method is formed around on a mounting electrode formed of Al film or Al alloy film on the side of a gate which extends to the outside, and an insulating film 4 is formed on the electrode 3a so as to protect the top of the mounting electrode 3a. Electrical connection between a TAB electrode and a TFT mounting electrode is performed by permitting the connecting particles 15 in an anisotropic film 14 to penetrate the insulation film 4 on the electrode 3a by TAB thermocompression bonding. Mounting electrode parts other than the TAB connecting part are protected by the anodic oxide film 19 and the insulating film 4, and corrosion clue to humid environment is prevented. |
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