LITHOGRAPHY SYSTEM

PURPOSE:To provide a lithography system capable of determining exposing data of high throughput and efficiently inputting this data to the exposure device side without making trial exposure by using an exposure device. CONSTITUTION:Arrangement D3 of plural pattern regions on respective masks, arrang...

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Bibliographische Detailangaben
Hauptverfasser:	MIKI TAKAMICHI, YOKOTA MUNEYASU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE:To provide a lithography system capable of determining exposing data of high throughput and efficiently inputting this data to the exposure device side without making trial exposure by using an exposure device. CONSTITUTION:Arrangement D3 of plural pattern regions on respective masks, arrangement and exposure sequence D4 to a photosensitive substrate are determined in an inference section 1a using neural networks in accordance with information (design data) D1 on the patterns to be formed on the substrate and information (design data) D2 for dividing the patterns to be formed into plural original plates. The determined arrangement D3, arrangement and exposure sequence D4 are transmitted via a communicating means to a controller 4 of the exposing device which integrally manages the plural exposure devices 3.