VACUUM DEPOSITION METHOD

PURPOSE:To facilitate the arc control and carry out the uniform and efficient deposition by applying a DC current to a spiral metallic coil arranged on the outer circumference of the cathode in a vacuum container, and generating the electromagnetic force to travel the arc in the spiral and regular m...

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Bibliographische Detailangaben
Hauptverfasser:	HAMANAKA YOSHITAKA, MATSUNAGA TSUNEFUMI, ONO YUTAKA
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PURPOSE:To facilitate the arc control and carry out the uniform and efficient deposition by applying a DC current to a spiral metallic coil arranged on the outer circumference of the cathode in a vacuum container, and generating the electromagnetic force to travel the arc in the spiral and regular manner. CONSTITUTION:A DC voltage 13 is applied between the anode 2 and a cathode 2 arranged in a vacuum container 1 to achieve the arc discharge, and the metal (e.g. nickel and chromium) is evaporated from the cathode 3 to achieve the vacuum deposition onto the article 4 to be coated (e.g. synthetic fiber and plastic plate). In this method, a metallic coil 29 is spirally arranged on the outer circumference of the cathode 3. This coil 29 is made of copper, and the cooling water is passed inside. The DC current 30 is applied to the coil 29, and the electromagnetic force generated thereby makes the arc travel in the spiral manner.