VISIBLE LIGHT-CURABLE TYPE PHOTOPOLYMERIZABLE COMPOSITION

PURPOSE:To obtain a dry film resist for laser direct imaging high in sensitivity to visible light and capable of forming a cured resist not dissolved in a peeling solution. CONSTITUTION:This visible light-curable type photopolymerizable composition comprises a mixture of 40-70 pts.wt. of a thermopla...

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Bibliographische Detailangaben
Hauptverfasser:	KUSHI KENJI, TOKUHARA CHIHO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CINEMATOGRAPHY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTED CIRCUITS
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Beschreibung
Zusammenfassung:	PURPOSE:To obtain a dry film resist for laser direct imaging high in sensitivity to visible light and capable of forming a cured resist not dissolved in a peeling solution. CONSTITUTION:This visible light-curable type photopolymerizable composition comprises a mixture of 40-70 pts.wt. of a thermoplastic polymer to be used for a binder obtained by copolymerizing at least one kind of monomer having 3-15C alpha,beta-unsaturated carboxylic group with another copolymerizable monomer in a proportion of 15-30 weight % to 85-70 weight %, 25-50 pts.wt. of a cross- linkable monomer having >=2 ethylenically unsaturated groups in the molecule, and 0.5-10 pts.wt. of a visible-light polymerization initiator. The cross-linkable monomer contains a 15-100 weight % compound of formula I and a 0-85 weight % compound of formula II and the total weight of them amounts to >=65 weight % of the cross-linkable monomer. In formulae I and II, n is a positive integer of 4-9.