WAFER SURFACE INSPECTING DEVICE FOR DUST-FREE CHAMBER

PURPOSE:To improve productivity by shortening an inspecting time even in a dustfree chamber having small floated foreign matter fine particles and small side with high cleanness in a wafer surface inspecting device for a dustfree chamber for inspecting the particles adhered to a surface of the wafer...

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1. Verfasser: NOMAKI KOJI
Format: Patent
Sprache:eng
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