WAFER SURFACE INSPECTING DEVICE FOR DUST-FREE CHAMBER

PURPOSE:To improve productivity by shortening an inspecting time even in a dustfree chamber having small floated foreign matter fine particles and small side with high cleanness in a wafer surface inspecting device for a dustfree chamber for inspecting the particles adhered to a surface of the wafer in the chamber. CONSTITUTION:A wafer surface inspecting device for a dustfree chamber comprises a measuring.evaluating unit 11 for measuring and evaluating number and size of foreign matter fine particles adhered to a surface of a semiconductor wafer in the chamber, an output unit 12 for outputting obtained data, a controller 13' and an operation unit 14' connected thereto to manage dusts of the chamber. The unit 11 has a wafer placing plate 21a having means for blowing the air in the chamber to a surface of the wafer 17 placed planely, purifying the air and discharging it and means for applying a predetermined potential to the wafer 17 to provide a fine particle adhering unit 21 connected to the units 13', 14' between the chamber and the unit 11.