WAFER SURFACE INSPECTING DEVICE FOR DUST-FREE CHAMBER

PURPOSE:To improve productivity by shortening an inspecting time even in a dustfree chamber having small floated foreign matter fine particles and small side with high cleanness in a wafer surface inspecting device for a dustfree chamber for inspecting the particles adhered to a surface of the wafer...

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1. Verfasser:	NOMAKI KOJI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING MEASURING ELECTRIC VARIABLES MEASURING MAGNETIC VARIABLES PHYSICS SEMICONDUCTOR DEVICES TESTING
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creator	NOMAKI KOJI
description	PURPOSE:To improve productivity by shortening an inspecting time even in a dustfree chamber having small floated foreign matter fine particles and small side with high cleanness in a wafer surface inspecting device for a dustfree chamber for inspecting the particles adhered to a surface of the wafer in the chamber. CONSTITUTION:A wafer surface inspecting device for a dustfree chamber comprises a measuring.evaluating unit 11 for measuring and evaluating number and size of foreign matter fine particles adhered to a surface of a semiconductor wafer in the chamber, an output unit 12 for outputting obtained data, a controller 13' and an operation unit 14' connected thereto to manage dusts of the chamber. The unit 11 has a wafer placing plate 21a having means for blowing the air in the chamber to a surface of the wafer 17 placed planely, purifying the air and discharging it and means for applying a predetermined potential to the wafer 17 to provide a fine particle adhering unit 21 connected to the units 13', 14' between the chamber and the unit 11.
format	Patent
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CONSTITUTION:A wafer surface inspecting device for a dustfree chamber comprises a measuring.evaluating unit 11 for measuring and evaluating number and size of foreign matter fine particles adhered to a surface of a semiconductor wafer in the chamber, an output unit 12 for outputting obtained data, a controller 13' and an operation unit 14' connected thereto to manage dusts of the chamber. 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subjects	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING MEASURING ELECTRIC VARIABLES MEASURING MAGNETIC VARIABLES PHYSICS SEMICONDUCTOR DEVICES TESTING
title	WAFER SURFACE INSPECTING DEVICE FOR DUST-FREE CHAMBER
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