PHOTOMASK

PURPOSE:To provide a photomask constituted so that the processing accuracy of a circuit wiring pattern transferred in the circuit forming area of a semiconductor wafer and a disconnection check pattern transferred in the TEG area of the semiconductor wafer can be reduced and pattern accuracy between...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	TAKEKUMA SHUNJI, NAKAGOME YOSHINOBU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE:To provide a photomask constituted so that the processing accuracy of a circuit wiring pattern transferred in the circuit forming area of a semiconductor wafer and a disconnection check pattern transferred in the TEG area of the semiconductor wafer can be reduced and pattern accuracy between both wafer areas can be enhanced. CONSTITUTION:This is the photomask 1 having a wiring check pattern 3 constituted so that the second comb-teeth shaped parts 3C1 of a second light transmitting pattern 3C formed to be an identical shape to a first light transmitting pattern 3A formed like comb-teeth are arranged between the first comb-teeth shaped parts 3A1 of the pattern 3A, a continuous third light transmitting pattern 3B is arranged between the patterns 3A and 3C and a phase shifter layer 4 is arranged to the pattern 3A and the pattern 3C or the pattern 3B.