SLIT TYPE APERTURE PLATE

PURPOSE:To significantly prolong the service life of a diaphragm employing a slit type aperture which is thick as compared with the slit width and to enhance the availability factor of a focus ion beam equipment employing such diaphragm. CONSTITUTION:Two plates 1, 1', each provided with one or...

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Bibliographische Detailangaben
Hauptverfasser:	ARIMA YOSHIO, KAWANAMI YOSHIMI
Format:	Patent
Sprache:	eng
Schlagworte:	GAMMA RAY OR X-RAY MICROSCOPES IRRADIATION DEVICES NUCLEAR ENGINEERING NUCLEAR PHYSICS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR
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Beschreibung
Zusammenfassung:	PURPOSE:To significantly prolong the service life of a diaphragm employing a slit type aperture which is thick as compared with the slit width and to enhance the availability factor of a focus ion beam equipment employing such diaphragm. CONSTITUTION:Two plates 1, 1', each provided with one or more recesses 3, 3' in one end face, are molded integrally while abutting the end faces to produce a slit type aperture constituting a diaphragm. The slit type aperture is not affected by the width of the slit 4 and can be made thick.