DEVICE FOR HOLDING FLAT DISC SUBSTRATE IN VACUUM CHAMBER OF COATING APPARATUS OR ETCHING APPARATUS

DEVICE FOR HOLDING FLAT DISC SUBSTRATE IN VACUUM CHAMBER OF COATING APPARATUS OR ETCHING APPARATUS

A rectangular substrate bed has on its top surface a row of disk-shaped holding members on which disk-shaped substrates are laterally positioned by a frame member having circular openings which expose the substrates. Seals are provided on each holding member so that substrates can be held in place b...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: PEETAA MAARAA
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE
SEMICONDUCTOR DEVICES
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:A rectangular substrate bed has on its top surface a row of disk-shaped holding members on which disk-shaped substrates are laterally positioned by a frame member having circular openings which expose the substrates. Seals are provided on each holding member so that substrates can be held in place by vacuum. The frame member is fixed to the substrate bed by clamps having pins which are received in bores at opposite ends of the substrate bed and the frame member.