DISPLAY SUBSTRATE AND ITS PRODUCTION

PURPOSE:To provide the display substrate having a multilayered thin film structure with decreased coverage defects and the process for simple production of such substrate. CONSTITUTION:A gate flattening film 5 of the thickness approximately equal to the thickness of gate electrodes 3 formed of a lig...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HIROBE TOSHIHIKO, MATSUMOTO HITOSHI
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:PURPOSE:To provide the display substrate having a multilayered thin film structure with decreased coverage defects and the process for simple production of such substrate. CONSTITUTION:A gate flattening film 5 of the thickness approximately equal to the thickness of gate electrodes 3 formed of a light shieldable material on the substrate 1 is formed over the entire part on the surface of the substrate 1 where the gate electrodes 3 are not formed and over entire level difference edge part of the gate electrodes 3. This gate flattening film 5 is formed by using the gate electrodes 3 as a light shielding mask and irradiating the substrate with exciting light 30 from the surface on the side opposite to the gate electrode 3 forming side of the substrate 3 while passing a photoexcitable gaseous material to the gate electrode 3 forming side of the substrate 1 and, therefore, there is no need for the mask to be exclusively used for forming the gate flattening film 5.