CAD SYSTEM
PURPOSE:To realize the CAD system by which the time required for a check of a face pattern subjected to drawing issue is short, there is no check omission with respect to the face pattern of every shape, and also, both of an insufficient part and a protruded part of painting-out can be checked. CONS...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | PURPOSE:To realize the CAD system by which the time required for a check of a face pattern subjected to drawing issue is short, there is no check omission with respect to the face pattern of every shape, and also, both of an insufficient part and a protruded part of painting-out can be checked. CONSTITUTION:In the CAD system for making a face pattern subjected to drawing issue by giving design data for showing the face pattern on a design to a photoplotter, and allowing the photoplotter to draw the face pattern, the face pattern on the design is expanded onto mesh data, and stored in a first memory 33. Also, the face pattern subjected to drawing issue is expanded onto the mesh data, and stored in a second memory 34. In such a state, an image processing operation is executed by reading out the mesh data from a first and a second memories 33, 34, and the part in which the face pattern subjected to drawing issue protrudes with respect to the face pattern on the design and the part in which area filling is insufficient are detected. Subsequently, whether the protruded part and the paintingout insufficient part which are detected exceed an allowable value or not, is checked. |
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