PRODUCTION OF ORGANIC THIN FILM

PURPOSE:To provide a method for producing an org. thin film by which various materials are applicable and excellent, efficiency of film production, excellent orientability of org. molecules and precise controllability of film thickness are ensured. CONSTITUTION:When an org. compd. is evaporated unde...

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Bibliographische Detailangaben
Hauptverfasser:	TSUMURA AKIRA, HIZUKA YUJI
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOSITIONS BASED THEREON DIFFUSION TREATMENT OF METALLIC MATERIAL GENERAL PROCESSES OF COMPOUNDING INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS PERFORMING OPERATIONS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION THEIR PREPARATION OR CHEMICAL WORKING-UP TRANSPORTING WORKING-UP
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Beschreibung
Zusammenfassung:	PURPOSE:To provide a method for producing an org. thin film by which various materials are applicable and excellent, efficiency of film production, excellent orientability of org. molecules and precise controllability of film thickness are ensured. CONSTITUTION:When an org. compd. is evaporated under a low pressure and deposited on a substrate 6 to produce an org. thin film, one or more among coordinate bond, covalent bond, a charge-transfer complex and hydrogen bond are formed by the org. compd. and the substrate 6, or the org. compd. 1 evaporated under a low pressure is allowed to react with an org. compd. 2 in a vapor phase and the resulting org. compd. 3 is deposited on the substrate 6 as a thin film.